PANAMA
Polymer Assisted Nano Mask
Benefits
- Suitable for chemically sensitive materials
- Easy to use
- Ultra-clean
Key words
- Lithography
- Microfabrication
- Dry/aqueous process
- InsStencil
Laboratory
- NEEL
Institutions
- CNRS
- GRENOBLE INP-UGA
- UGA
Linksium Continuum
- Maturation
Context
Innovative electronic and microfluidic devices increasingly incorporate new materials, some of which are incompatible with standard microfabrication processes and therefore limiting their integration.
Technology
Thanks to a polymer mask adapted to each specific feature of the target material, the PANAMA process can replace any microfabrication step that is too delicate or too difficult to implement.
Advantages
The PANAMA solution eliminates the constraints of conventional lithography (adhesion, material sensitivity, heavy equipment) by offering a universal, dry, low-temperature structuring solution.
State of progress
PANAMA technology is validated at TRL 3 for the production of patterns down to 300 nm.
Applications
Mask technology unlocks solutions for the microfabrication of MEMS, microfluidic circuits, and photonic devices.
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